The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Dec. 15, 2015
Applicant:
Cytec Industries Inc, Princeton, NJ (US);
Inventors:
Airong Song, Larchmont, NY (US);
Lei Zhang, Stamford, CT (US);
Douglas Cywar, Danbury, CT (US);
Haunn-Lin Tony Chen, Morganville, NJ (US);
Matthew Taylor, Wilton, CT (US);
Assignee:
Cytec Industries Inc., Princeton, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 126/02 (2006.01); C02F 5/10 (2006.01); C08F 8/42 (2006.01); C02F 5/12 (2006.01); C08F 130/08 (2006.01); C02F 1/68 (2006.01); C08F 226/02 (2006.01); C08L 37/00 (2006.01); C02F 103/02 (2006.01); C08F 271/00 (2006.01);
U.S. Cl.
CPC ...
C08F 126/02 (2013.01); C02F 5/10 (2013.01); C02F 5/12 (2013.01); C08F 8/42 (2013.01); C08F 130/08 (2013.01); C02F 1/68 (2013.01); C02F 2103/02 (2013.01); C02F 2103/023 (2013.01); C08F 226/02 (2013.01); C08F 271/00 (2013.01); C08L 37/00 (2013.01);
Abstract
Silicon containing polyamine scale inhibitors derived from poly(primary amine)s are disclosed. The scale inhibitors can be used to reduce siliceous scale formation in industrial process streams such as alumina recovery process streams, nuclear waste streams and kraft paper mill effluent streams.