The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Nov. 15, 2018
Applicants:

Cornell University, Ithaca, NY (US);

University of Notre Dame Du Lac, Notre Dame, IN (US);

Inventors:

SM Islam, Ithaca, NY (US);

Vladimir Protasenko, Ithaca, NY (US);

Huili Grace Xing, Ithaca, NY (US);

Debdeep Jena, Ithaca, NY (US);

Jai Verma, Portland, OR (US);

Assignee:

Cornell University, Ithaca, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 33/14 (2010.01); H01L 33/00 (2010.01); H01L 33/02 (2010.01); H01L 27/15 (2006.01); H01L 33/06 (2010.01); H01L 33/12 (2010.01); H01L 33/30 (2010.01); H01L 33/38 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 27/15 (2013.01); H01L 33/007 (2013.01); H01L 33/0025 (2013.01); H01L 33/0062 (2013.01); H01L 33/0075 (2013.01); H01L 33/02 (2013.01); H01L 33/025 (2013.01); H01L 33/06 (2013.01); H01L 33/12 (2013.01); H01L 33/14 (2013.01); H01L 33/30 (2013.01); H01L 33/325 (2013.01); H01L 33/38 (2013.01);
Abstract

A DUV-LED including a bottom substrate, a n-contact/injection layer formed on the bottom substrate, a p-contact region, and an emitting active region between the n-contact/injection layer and the contact region. The emitting active region includes at least one GaN quantum heterostructure. The at least one GaN quantum heterostructures is sized and shaped to determine a certain emission wavelength. Preferably, the certain emission wavelength is in a range of approximately 219-280 nm. In one embodiment, the size is controlled by precisely controlling parameters selected from the group consisting of: an epitaxial deposition time; a Ga/N ratio; a thermal annealing time; a temperature during deposition; and combinations thereof.


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