The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Jul. 31, 2018
Applicant:
Centre National DE LA Recherche Scientifique, Paris, FR;
Inventors:
Arnaud Etcheberry, Colombes, FR;
Anne-Marie Goncalves, Marly-le-Roi, FR;
Jean-Luc Pelouard, Paris, FR;
Mathieu Fregnaux, Montigny-le-Bretonneux, FR;
Anais Loubat, Puteaux, FR;
Assignee:
Centre National De La Recherche Scientifique, Paris, FR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/30604 (2013.01);
Abstract
The invention relates to the chemical etching of a semiconductor material, including: In particular, the aforementioned mask is produced in a material including polyphosphazene, which material protects the underlying semiconductor especially well.