The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Feb. 04, 2020
Headway Technologies, Inc., Milpitas, CA (US);
Yan Wu, Cupertino, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A spin transfer torque reversal assisted magnetic recording (STRAMR) device is disclosed wherein a flux change layer (FCL) is formed between a main pole (MP) trailing side and a trailing shield (TS). The FCL has a magnetization that flips to a direction substantially opposing the write gap magnetic field when a direct current (DC) of sufficient current density is applied across the STRAMR device thereby increasing reluctance in the WG and producing a larger write field output at the air bearing surface. Heat transfer in the STRAMR device is enhanced and production cost is reduced by enlarging the STRAMR width to be essentially equal to that of the TS, and where the TS and STRAMR widths are formed using the same process steps. Bias voltage is used to control the extent of FCL flipping to a center portion to optimize the gain in area density capability in the recording system.