The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Mar. 13, 2019
Postech Academy-industry Foundation, Pohang-si, KR;
POSTECH ACADEMY-INDUSTRY FOUNDATION, Pohang-si, KR;
Abstract
A dielectric based metasurface hologram device includes: a substrate layer provided at a lowermost portion of the dielectric based metasurface hologram device; and a dielectric layer forming a geometric metasurface on the substrate layer. The substrate layer includes a plurality of unit cells which are continuous, and the dielectric layer includes a plurality of nano-structures which are disposed with a predetermined distance therebetween. The single nano-structure is disposed on the unit cell, and a hologram image is formed when an incident light from a light source is reflected by the nano-structure so that a phase of the light is controlled.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile