The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Apr. 06, 2017
Applicant:

Murata Manufacturing Co., Ltd., Nagaokakyo, JP;

Inventors:

Naoki Kawara, Nagaokakyo, JP;

Masaru Banju, Nagaokakyo, JP;

Takashi Kondo, Nagaokakyo, JP;

Seiji Kamba, Nagaokakyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/40 (2006.01); G01N 21/3581 (2014.01); B01D 29/00 (2006.01); B01D 29/56 (2006.01);
U.S. Cl.
CPC ...
G01N 1/4077 (2013.01); B01D 29/0093 (2013.01); B01D 29/0095 (2013.01); B01D 29/56 (2013.01); G01N 21/3581 (2013.01); G01N 2001/4088 (2013.01);
Abstract

A film-shaped aperture array includes a first principal surface and a second principal surface opposed to each other and a plurality of apertures penetrating the first principal surface and the second principal surface. A projection projecting from the second principal surface in a normal direction of the second principal surface is provided in at least one region in contact with three or more of the plurality of apertures in a part of the second principal surface, when viewed in plan from the normal direction of the second principal surface.


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