The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Dec. 19, 2019
Applicant:

Hitachi Metals, Ltd., Tokyo, JP;

Inventor:

Alexei V. Smirnov, Fort Collins, CO (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 31/02 (2006.01); G01F 25/00 (2006.01); G05D 7/06 (2006.01); G01F 1/86 (2006.01);
U.S. Cl.
CPC ...
G01F 25/0007 (2013.01); G05D 7/0629 (2013.01); G01F 1/86 (2013.01);
Abstract

Mass flow controllers and methods for controlling mass flow controllers are disclosed. One method includes providing a process gas through a flow sensor of the mass flow controller, obtaining a gas-adjusted sensitivity coefficient for the flow sensor, and obtaining gas-adjusted nonlinearity data for the flow sensor. The method also includes producing gas-adjusted characterization data for the flow sensor using the gas-adjusted sensitivity coefficient and the gas-adjusted nonlinearity data. A flow value from the gas-adjusted characterization data is obtained using a flow sensor signal from the flow sensor, and the flow value is used along with a setpoint signal to control a valve of the mass flow controller.


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