The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Oct. 17, 2017
Applicant:

Daikin Industries, Ltd., Osaka, JP;

Inventors:

Satoru Sakae, Osaka, JP;

Takahito Nakayama, Osaka, JP;

Takenori Mezaki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25B 49/02 (2006.01); F25B 1/00 (2006.01); F25D 11/00 (2006.01); F25D 13/00 (2006.01);
U.S. Cl.
CPC ...
F25B 49/02 (2013.01); F25B 1/00 (2013.01); F25B 2500/222 (2013.01); F25B 2600/11 (2013.01); F25B 2700/1933 (2013.01); F25B 2700/21152 (2013.01); F25D 11/00 (2013.01); F25D 13/00 (2013.01);
Abstract

Provided is a refrigeration apparatus that secures safety while suppressing an increase in cost. A refrigeration apparatus performs a refrigeration cycle in a refrigerant circuit including a compressor, a heat source-side heat exchanger, and a usage-side heat exchanger. The refrigeration apparatus comprises a usage-side fan providing an air flow, and a controller. The usage-side fan is disposed in a target space where inside air is cooled. The controller performs a refrigerant leak determination process to determine whether a refrigerant leak occurs, based on a state of a refrigerant in the refrigerant circuit. When the controller performs the refrigerant leak determination process to determine that a refrigerant leak occurs, then the controller performs leakage refrigerant agitation control to operate the usage-side fan so as to suppress local emergence of a region where the refrigerant leaks at a high concentration in the target space.


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