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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11041097 B1

PDFFull Text
Date of Patent:
Jun. 22, 2021

Filed:

Oct. 23, 2019

Polishing composition and method of fabricating semiconductor device using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Kyung-il Park, Suwon-si, KR;

Myeong Hoon Han, Sungnam-si, KR;

Sanghyun Park, Hwasung-si, KR;

Wonki Hur, Suwon-si, KR;

Seungho Park, Suwon-si, KR;

Hao Cui, Suwon-si, KR;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Soulbrain Co., Ltd., Seongnam-si, KR;

Attorney:

Lee IP Law, P.C.

Primary Examiner:

Thomas T Pham

Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 27/24 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 27/2427 (2013.01); H01L 27/2463 (2013.01); H01L 45/06 (2013.01); H01L 45/144 (2013.01); H01L 45/1641 (2013.01); H01L 45/1683 (2013.01);
Abstract

A polishing composition and a method of fabricating a semiconductor device using the same, the polishing composition including an abrasive; a first additive that includes a C5 to C30 hydrocarbon including an amide group and a carboxyl group or a C5 to C30 hydrocarbon including two or more amine groups; and a second additive that includes a sulfonic acid, a sulfonate, or a sulfonate salt.

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Park, Kyung-il. (2021). Polishing composition and method of fabricating semiconductor device using the same (U.S. Patent No. 11041097). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11041097

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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