The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Oct. 23, 2019
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Kyung-il Park, Suwon-si, KR;
Myeong Hoon Han, Sungnam-si, KR;
Sanghyun Park, Hwasung-si, KR;
Wonki Hur, Suwon-si, KR;
Seungho Park, Suwon-si, KR;
Hao Cui, Suwon-si, KR;
Assignees:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Soulbrain Co., Ltd., Seongnam-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 27/24 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 27/2427 (2013.01); H01L 27/2463 (2013.01); H01L 45/06 (2013.01); H01L 45/144 (2013.01); H01L 45/1641 (2013.01); H01L 45/1683 (2013.01);
Abstract
A polishing composition and a method of fabricating a semiconductor device using the same, the polishing composition including an abrasive; a first additive that includes a C5 to C30 hydrocarbon including an amide group and a carboxyl group or a C5 to C30 hydrocarbon including two or more amine groups; and a second additive that includes a sulfonic acid, a sulfonate, or a sulfonate salt.