The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Jan. 17, 2018
Covestro Deutschland Ag, Leverkusen, DE;
Andreas Bulan, Langenfeld, DE;
Johann Rechner, Kempen, DE;
Rainer Weber, Odenthal, DE;
Juergen Hecke, Burscheid, DE;
Wolfgang Kern, Moers, DE;
Martin Leipnitz, Cologne, DE;
Bernd Henning, Leverkusen, DE;
Covestro Deutschland AG, Leverkusen, DE;
Abstract
The invention relates to a method for flexibly controlling the use of hydrochloric acid having an HCl concentration of at least 10 wt %, in particular at a volume flow rate of at least 1 m/h, obtained from a continuous chemical production process (A). In the method, purified hydrochloric acid () from a hydrochloric acid store (E) is optionally fed to a dispatch station (H), an HCl electrolysis station (F) and a chloralkali electrolysis station (L), which are consumption points for the hydrochloric acid, or to a neutralisation station (G) in that if one or more of said consumption points (H, F, L) is not available or if there are bottlenecks at the consumption points (H, F, L), the hydrochloric acid () is fed to the neutralisation station (G) and neutralised with concentrated alkali solution (), in particular with concentrated sodium hydroxide solution, and the resulting salt solution () is fed either to the chloralkali process station (L) or to a disposal station (M).