The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Dec. 15, 2017
Applicant:

Giesecke+devrient Currency Technology Gmbh, Munich, DE;

Inventors:

Andreas Rauch, Ohlstadt, DE;

Christian Fuhse, Otterfing, DE;

Josef Schinabeck, Garmisch-Partenkirchen, DE;

André Gregarek, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 25/435 (2014.01); B42D 25/29 (2014.01); B42D 25/351 (2014.01); B42D 25/355 (2014.01); B42D 25/373 (2014.01);
U.S. Cl.
CPC ...
B42D 25/435 (2014.10); B42D 25/29 (2014.10); B42D 25/351 (2014.10); B42D 25/355 (2014.10); B42D 25/373 (2014.10);
Abstract

A method includes using a lenticular image having a lens grid composed of a plurality of microlenses and a metallic motif layer arranged spaced apart from the lens grid; the refractive effect of the microlenses defines a focal plane and the metallic motif layer being arranged substantially in the focal plane; a line width is chosen for the demetalized sub-regions to be produced in the metallic motif layer; a marking laser source having a laser wavelength λ is selected such that the resolving power D(λ) of the microlenses of the lenticular image at the selected laser wavelength λ substantially corresponds to the line width of the demetalized sub-regions to be produced; and the metallic motif layer is impinged on through the microlenses with laser radiation of the marking laser source to produce demetalized sub-regions in the metallic motif layer.


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