The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Sep. 18, 2018
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Logan L. Simpson, Coupland, TX (US);

Seth J. Bamesberger, Austin, TX (US);

John Williamson, Thorndale, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 12/32 (2018.01); B05B 12/34 (2018.01); B05B 12/22 (2018.01); B05C 11/10 (2006.01); B05C 5/02 (2006.01); G03F 7/00 (2006.01); B05B 1/14 (2006.01); B05B 12/16 (2018.01);
U.S. Cl.
CPC ...
B05B 12/32 (2018.02); B05B 1/14 (2013.01); B05B 12/16 (2018.02); B05B 12/22 (2018.02); B05B 12/34 (2018.02); B05C 5/0212 (2013.01); B05C 5/0266 (2013.01); B05C 11/1039 (2013.01); G03F 7/0002 (2013.01); B05C 5/025 (2013.01);
Abstract

A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.


Find Patent Forward Citations

Quick Actions:

Simpson, Logan. (2021). Dispenser shield with adjustable aperture to improve drop placement and residual layer thickness (U.S. Patent No. 11040366). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11040366

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