The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Feb. 21, 2019
Applicant:

Siemens Healthcare Gmbh, Erlangen, DE;

Inventor:

Andrea Deutinger, Forstern, DE;

Assignee:

SIEMENS HEALTHCARE GMBH, Erlangen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 6/00 (2006.01); G21K 1/02 (2006.01); G21K 1/06 (2006.01); G02B 5/18 (2006.01); G01N 23/083 (2018.01);
U.S. Cl.
CPC ...
A61B 6/484 (2013.01); A61B 6/4035 (2013.01); G01N 23/083 (2013.01); G02B 5/1838 (2013.01); G02B 5/1847 (2013.01); G02B 5/1852 (2013.01); G02B 5/1857 (2013.01); G21K 1/025 (2013.01); G21K 1/06 (2013.01); G21K 2207/005 (2013.01);
Abstract

In a method for producing a microstructure component, which is used in particular as an x-ray phase contrast grating in an x-ray device, a material absorbing x-rays is poured into a mold able at least to be deformed about one bending axis, which is formed by a silicon substrate and which has a plurality of cutouts running in a direction of the thickness of the silicon substrate with dimensions in the micrometer range. The mold into which the material is poured is heated up to a working temperature value lying above the room temperature and below a melting temperature value of the material which is poured into it and is formed into a final contour as per specifications.


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