The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Feb. 05, 2020
Renesas Electronics Corporation, Tokyo, JP;
Takahiro Mori, Tokyo, JP;
RENESAS ELECTRONICS CORPORATION, Tokyo, JP;
Abstract
A semiconductor device includes a semiconductor substrate including a first epitaxial layer having a first surface and a second surface, a second epitaxial layer, a buried region formed across the first epitaxial layer and the second epitaxial layer, and a gate electrode. The second epitaxial layer includes a drain region, a source region, a body region, a drift region, a first region, and a second region. The first region is formed below at least the drain region. The second region has first and second ends in a channel length direction. The first end is located between the body region and the drain region in the channel length direction. The second region extends from the first end toward the second end such that the second end extends below at least the source region. An impurity concentration of the second region is greater than an impurity concentration of the first region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile