The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2021

Filed:

Sep. 24, 2018
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Takumi Fujimoto, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 21/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0878 (2013.01); H01L 21/046 (2013.01); H01L 29/0821 (2013.01); H01L 29/1608 (2013.01); H01L 29/66068 (2013.01); H01L 29/7397 (2013.01); H01L 29/7805 (2013.01); H01L 29/7813 (2013.01);
Abstract

A silicon carbide semiconductor device includes a semiconductor substrate and a first semiconductor layer of the first conductivity type; a second semiconductor layer of a second conductivity type; a first semiconductor region of the first conductivity type; a gate electrode provided opposing at least a surface of the second semiconductor layer between the first semiconductor region and the first semiconductor layer, across a gate insulating film; and a first electrode provided on surfaces of the first semiconductor region and the second semiconductor layer. Protons are implanted in a first region of the semiconductor substrate, spanning at least 2 μm from a surface of the semiconductor substrate facing toward the first semiconductor layer; and in a second region of the first semiconductor layer, spanning at least 3 μm from a surface of the first semiconductor layer facing toward the semiconductor substrate. The protons having a concentration in a range from 1×10/cmto 1×10/cm.


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