The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Apr. 18, 2018
Baidu Usa Llc, Sunnyvale, CA (US);
Baidu.com Times Technology (Beijing) Co., Ltd., Beijing, CN;
Fan Zhu, Sunnyvale, CA (US);
Xin Xu, Beijing, CN;
Qi Kong, Sunnyvale, CA (US);
Yuchang Pan, Beijing, CN;
Feiyi Jiang, Beijing, CN;
Liangliang Zhang, San Jose, CA (US);
Jiaming Tao, Sunnyvale, CA (US);
Haoyang Fan, Sunnyvale, CA (US);
Hui Jiang, Beijing, CN;
BAIDU USA LLC, Sunnyvale, CA (US);
BAIDU.COM TIMES TECHNOLOGY (BEIJING) CO., LTD., Beijing, CN;
Abstract
A first localization system performs a first localization using a first set of sensors to track locations of the ADV along the path from a starting point to a destination point. A first localization curve is generated as a result representing the locations of the ADV along the path tracked by the first localization system. Currently, a second localization system performs a second localization using a second set of sensors to track the locations of the ADV along the path. A second localization curve is generated as a result representing the locations of the ADV along the path tracked by the second localization system. A system delay of the second localization system is determined by comparing the second localization curve against the first localization curve as a localization reference. The system delay of the second localization system can then be utilized to compensate path planning of the ADV subsequently.