The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
May. 23, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 309/73 (2006.01); G03F 7/039 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); C08G 61/02 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0395 (2013.01); C07C 309/73 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); C08G 61/02 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/2004 (2013.01); C08F 220/281 (2020.02); C08F 220/283 (2020.02); C08F 220/382 (2020.02); C08G 2261/1452 (2013.01);
Abstract
An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is processed by lithography, a pattern of rectangular profile having high resolution and reduced LER is formed.
Inoue, Naoya. (2021). Onium salt, chemically amplified positive resist composition, and resist pattern forming process (U.S. Patent No. 11036136). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11036136
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile