The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Oct. 19, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Matthew C. Traub, Austin, TX (US);
Tom H. Rafferty, Austin, TX (US);
Whitney Longsine, Austin, TX (US);
Yeshwanth Srinivasan, New York, NY (US);
Van Nguyen Truskett, Austin, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Methods and systems for dispensing fluid in imprint lithography, including selecting drop patterns, each associated with different target locations on a substrate and a selected volume for each drop of each drop pattern; selecting a plurality of subsets of nozzles of a dispenser, each subset configured to dispense drops corresponding to each drop pattern; for each drop pattern: dispensing the drops corresponding to the drop pattern from each subset of nozzles; obtaining an image of the drops from each subset of nozzles; and processing the image from each subset of nozzles to determine a positional error of the drops with respect to the target locations and a volumetric error of the drops with respect to the selected volume for each drop; and adjusting, based on the positional error and the volumetric error of the drops from each subset of nozzles for each drop pattern, dispense parameters of the dispenser.