The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Dec. 28, 2018
Beijing Didi Infinity Technology and Development Co., Ltd., Beijing, CN;
Abstract
Embodiments of the disclosure provide systems and methods for correcting a high-definition map. The system may include a communication interface configured to receive point cloud data of a scene captured by a LiDAR. The system may further include a storage configured to store the point cloud data, and at least one processor. The at least one processor may be configured to detect at least one obstructing object from the point cloud data, and position at least one hole in the point cloud data caused by the at least one obstructing object. The at least one processor is further configured to estimate non-obstructed point cloud data for the at least one hole as if the scene was captured without the at least one obstructing object, and correct the high-definition map by repairing the received point cloud data with the non-obstructed point cloud data.