The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Jun. 24, 2016
Applicant:
University of Dundee, Dundee, GB;
Inventor:
Amin Abdolvand, Dundee, GB;
Assignee:
UNIVERSITY OF DUNDEE, Dundee, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/0622 (2014.01); B23K 26/082 (2014.01); B23K 26/352 (2014.01); B23K 103/04 (2006.01); B23K 103/06 (2006.01); B23K 103/10 (2006.01); B23K 103/12 (2006.01); B23K 103/14 (2006.01);
U.S. Cl.
CPC ...
B23K 26/3584 (2018.08); B23K 26/0006 (2013.01); B23K 26/0624 (2015.10); B23K 26/082 (2015.10); B23K 26/352 (2015.10); B23K 2103/05 (2018.08); B23K 2103/06 (2018.08); B23K 2103/10 (2018.08); B23K 2103/12 (2018.08); B23K 2103/14 (2018.08);
Abstract
A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (), comprises applying laser radiation to the surface of the target () to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series of laser pulses and the power density of the pulses is in a range 0.01 TW/cmto 3 TW/cm, optionally 0.1 TW/cmto 3 TW/cm.