The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
May. 08, 2017
Radco Infusion Technologies, Llc, Toledo, OH (US);
Southwire Company Llc, Carrollton, GA (US);
Juan Alberto Galindo Gonzalez, Powder Springs, GA (US);
Richard Yorde, Maumee, OH (US);
Rick Anderson, Toledo, OH (US);
Jess A. McGilvery, Liberty Center, OH (US);
Washington I. McGilvery, Liberty Center, OH (US);
Douglas Michael, Swanton, OH (US);
Randy D. Kummer, Villa Rica, GA (US);
RADCO INFUSION TECHNOLOGIES, LLC, Toledo, OH (US);
Southwire Company LLC, Carrollton, GA (US);
Abstract
Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.