The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Feb. 20, 2020
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Christian Voss-Wolff, Sonnenbuhl, DE;

Marc Schirski, Reutlingen, DE;

Thomas Markus Keinz, Pfullingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/344 (2018.01); G06K 9/32 (2006.01); H04N 13/383 (2018.01); G06T 7/70 (2017.01); G06T 7/593 (2017.01); G06T 17/20 (2006.01); H04N 13/00 (2018.01);
U.S. Cl.
CPC ...
H04N 13/344 (2018.05); G06K 9/3233 (2013.01); G06T 7/593 (2017.01); G06T 7/70 (2017.01); G06T 17/20 (2013.01); H04N 13/383 (2018.05); H04N 2013/0081 (2013.01);
Abstract

Example image reprojection methods are disclosed. In one example, a depth buffer of depth values corresponding to an image produced based on a predicted pose is divided into a plurality of tiles. For each tile of the plurality of tiles, a planar deviation error value that estimates a geometric complexity of the tile and penalizes the tile in proportion to an extent to which a geometry of the tile deviates from a plane is calculated. A tessellated mesh of the plurality of tiles is produced based on the planar deviation error values calculated for the plurality of tiles. An updated pose is received. The tessellated mesh is rendered based on the updated pose to output a reprojected image.


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