The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Oct. 24, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka, JP;

Inventors:

Kenji Kimoto, Osaka, JP;

Naoki Koide, Osaka, JP;

Yuta Matsumoto, Osaka, JP;

Junichi Nakamura, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/036 (2006.01); H01L 31/0224 (2006.01); H01L 31/0747 (2012.01); H01L 31/0216 (2014.01); H01L 31/0352 (2006.01); H01L 31/068 (2012.01); H02S 10/00 (2014.01);
U.S. Cl.
CPC ...
H01L 31/036 (2013.01); H01L 31/02167 (2013.01); H01L 31/022425 (2013.01); H01L 31/022441 (2013.01); H01L 31/0352 (2013.01); H01L 31/068 (2013.01); H01L 31/0747 (2013.01); H02S 10/00 (2013.01); Y02E 10/547 (2013.01);
Abstract

There is provided a photoelectric conversion element which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline semiconductor layer from increasing, and can improve the element characteristics. A photoelectric conversion element () includes a semiconductor substrate (), a first semiconductor layer (), a second semiconductor layer (), a first electrode (), and a second electrode (). The first semiconductor layer has a first conductive type. The second semiconductor layer has a second conductive type. The first electrode is formed on the first semiconductor layer. The second electrode is formed on the second semiconductor layer. The first electrode includes a first transparent conductive layer () formed on the first semiconductor layer, and a first metal layer () formed on the first transparent conductive layer. The first metal layer includes a plurality of metal crystal grains in which the average crystal grain size in the in-surface direction of the first metal layer is greater than the thickness of the first metal layer.


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