The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Mar. 01, 2018
Marvell International Ltd., Hamilton, BM;
Aarthi Sridharan, Singapore, SG;
Gong Cheng, Singapore, SG;
Premachandran Chirayarikathuveedu, Clifton Park, NY (US);
Fahad Mirza, Clifton Park, NY (US);
Carole Graas, Ballston Spa, NY (US);
Sricharan Tubati, Singapore, SG;
Nurul Islam Mohd, Singapore, SG;
MARVELL ASIA PTE, LTD., Singapore, SG;
Abstract
A method for forming a sensor with increased overhang to prevent passivation stress fractures is provided. Embodiments include forming a first passivation layer over a dielectric layer patterned over a first top metal layer of a logic region of a sensor and a second top metal layer of an array region of the sensor; planarizing the first passivation layer and the dielectric layer to form a level surface above the first top metal layer and the second top metal layer; etching the dielectric layer to form a pad opening in the array region of the sensor based on a predetermined overhang value, the pad opening exposing a portion of the surface of the second top metal layer; and forming a second passivation layer over the level surface and the pad opening in the array region.