The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Aug. 24, 2017
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Naoto Ito, Tokyo, JP;

Yu Yamazawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/10 (2006.01); H01J 37/14 (2006.01); H01J 37/244 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/10 (2013.01); H01J 37/1475 (2013.01); H01J 37/244 (2013.01); H01J 2237/0473 (2013.01); H01J 2237/0475 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/2806 (2013.01);
Abstract

A charged particle beam device capable of easily discriminating the energy of secondary charged particles is realized. The charged particle beam device includes a charged particle source, a sample stage on which a sample is placed, an objective lens that irradiates the sample with a charged particle beam from the charged particle source, a deflector that deflects secondary charged particles released by irradiating the sample with the charged particle beam, a detector that detects the secondary charged particles deflected by the deflector, a sample voltage control unit that applies a positive voltage to the sample or the sample stage, and a deflection intensity control unit that controls the intensity with which the deflector deflects the secondary charged particles.


Find Patent Forward Citations

Loading…