The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Jul. 29, 2020
Applicant:

Realtek Semiconductor Corporation, Hsinchu, TW;

Inventors:

Tien-Kuo Lin, Taichung, TW;

Li-Yi Lin, Changhua County, TW;

Yun-Chih Chang, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/396 (2020.01); G06F 30/398 (2020.01); G06F 30/392 (2020.01); G06F 115/06 (2020.01);
U.S. Cl.
CPC ...
G06F 30/396 (2020.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 2115/06 (2020.01);
Abstract

Disclosed is an integrated circuit (IC) layout method capable of reducing an IR drop as a result of an IC layout process. The method includes the following steps: performing the IC layout process and obtaining an original IC layout; performing an IR drop analysis on the original IC layout and identifying an IR drop hot zone; determining a circuit density limit of the IR drop hot zone; and performing the IC layout process again according to the circuit density limit and obtaining an updated IC layout.


Find Patent Forward Citations

Loading…