The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Aug. 24, 2018
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Yuichiro Goto, Haibara-gun, JP;
Kazuhiro Marumo, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); B81C 1/00 (2006.01); G03F 7/027 (2006.01); H01L 21/027 (2006.01); B82Y 40/00 (2011.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B81C 1/0046 (2013.01); G03F 7/027 (2013.01); H01L 21/0271 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); B82Y 40/00 (2013.01); G03F 7/0752 (2013.01);
Abstract
Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.