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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11029596 B1

PDFFull Text
Date of Patent:
Jun. 08, 2021

Filed:

Jan. 31, 2017

Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Ji Young Hwang, Daejeon, KR;

Han Min Seo, Daejeon, KR;

Nam Seok Bae, Daejeon, KR;

Seung Heon Lee, Daejeon, KR;

Dong Hyun Oh, Daejeon, KR;

Jungsun You, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:

Dentons US LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 1/48 (2012.01); G03F 1/76 (2012.01); G03F 1/38 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/76 (2013.01); G03F 1/38 (2013.01); G03F 1/48 (2013.01); G03F 7/0002 (2013.01); G03F 7/20 (2013.01); G03F 7/70791 (2013.01); H01L 21/033 (2013.01); G03F 7/30 (2013.01);
Abstract

The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.

Find Patent Forward Citations

Hwang, Ji. (2021). Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby (U.S. Patent No. 11029596). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11029596

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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