The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Jan. 31, 2017
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Ji Young Hwang, Daejeon, KR;
Han Min Seo, Daejeon, KR;
Nam Seok Bae, Daejeon, KR;
Seung Heon Lee, Daejeon, KR;
Dong Hyun Oh, Daejeon, KR;
Jungsun You, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/48 (2012.01); G03F 1/76 (2012.01); G03F 1/38 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/76 (2013.01); G03F 1/38 (2013.01); G03F 1/48 (2013.01); G03F 7/0002 (2013.01); G03F 7/20 (2013.01); G03F 7/70791 (2013.01); H01L 21/033 (2013.01); G03F 7/30 (2013.01);
Abstract
The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.