The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Aug. 30, 2019
Applicants:

National Synchrotron Radiation Research Center, Hsinchu, TW;

Academia Sinica, Taipei, TW;

Inventors:

Bing-Ming Cheng, Hsinchu, TW;

Hsiao-Chi Lu, Hsinchu, TW;

Jen-Iu Lo, Hsinchu, TW;

Huan-Cheng Chang, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/58 (2006.01); G01T 1/202 (2006.01); G01J 1/42 (2006.01); H01L 31/0232 (2014.01); H01L 31/09 (2006.01);
U.S. Cl.
CPC ...
G01T 1/2023 (2013.01); G01J 1/429 (2013.01); G01J 1/58 (2013.01); H01L 31/02322 (2013.01); H01L 31/09 (2013.01);
Abstract

The present disclosure provides a fluorescent nitrogen-vacancy diamond (FNVD) having a plurality of nitrogen-vacancy centers with a concentration about 1 ppm to 10,000 ppm. The FNVD as built-in fluorophores exhibit a nearly constant emission profile over 540 nm to 850 nm upon excitation by vacuum ultraviolet (VUV), extreme ultraviolet (EUV) and X-rays for the energy larger than 6.2 eV. Applying the FNVD sensor can measure VUV/EUV/X-rays as a sensing sheet, manufacturing method and uses thereof, sensor and lithography apparatus. The superb photostability and broad applicability of FNVDs offer a promising solution for the long-standing problem of lacking robust and reliable detectors for VUV, EUV, and X-rays.


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