The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Dec. 22, 2017
Applicant:
Kao Corporation, Tokyo, JP;
Inventors:
Daisuke Kayakubo, Wakayama, JP;
Jun Naganuma, Wakayama, JP;
Assignee:
KAO CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/34 (2006.01); C11D 3/04 (2006.01); H01L 21/02 (2006.01); C11D 3/20 (2006.01); C11D 11/00 (2006.01); C11D 3/34 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
C11D 3/042 (2013.01); C11D 3/2096 (2013.01); C11D 3/349 (2013.01); C11D 11/0047 (2013.01); H01L 21/02041 (2013.01); H01L 21/304 (2013.01);
Abstract
In one aspect, provided is a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition having excellent cleaning properties against ceria and being capable of reducing a temporal change in the solubility of ceria. In one aspect, the present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition containing a component A, a component B, a component C, and a component D,