The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Aug. 04, 2017
Applicant:

Nippon Sheet Glass Company, Limited, Tokyo, JP;

Inventors:

Koichiro Nakamura, Kanagawa, JP;

Masahiro Hioki, Mie, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09C 1/00 (2006.01); C09C 3/06 (2006.01); C08K 3/22 (2006.01); C08K 3/40 (2006.01); C08K 9/02 (2006.01); C09D 7/62 (2018.01); C09D 133/12 (2006.01); C09D 169/00 (2006.01); C09D 7/40 (2018.01); C09C 1/28 (2006.01); C09D 17/00 (2006.01); C09C 1/40 (2006.01); C08K 7/00 (2006.01);
U.S. Cl.
CPC ...
C09C 1/0051 (2013.01); C09C 1/28 (2013.01); C09C 1/40 (2013.01); C09C 3/06 (2013.01); C09D 7/70 (2018.01); C09D 17/00 (2013.01); C09D 133/12 (2013.01); C09D 169/00 (2013.01); C01P 2004/62 (2013.01); C01P 2004/84 (2013.01); C08K 3/40 (2013.01); C08K 7/00 (2013.01); C08K 9/02 (2013.01); C08K 2003/2227 (2013.01); C09C 2200/102 (2013.01); C09C 2200/1004 (2013.01); C09C 2200/301 (2013.01); C09C 2200/302 (2013.01); C09C 2200/303 (2013.01);
Abstract

The present invention provides a new glitter pigment suitable for providing high-brightness whitish reflected light. The glitter pigment according to the present invention includes: a flaky substrate; and a silicon oxide layerand a titanium oxide layerformed in this order on the flaky substrate, wherein in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 to 322 nm, the silicon oxide layer has a thickness of 89 to 109 nm, and the titanium oxide layer has a thickness of 51 to 86 nm. In the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 to 280 nm, the silicon oxide layer has a thickness of 79 to 102 nm, and the titanium oxide layer has a thickness of 47 to 87 nm.


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