The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Aug. 19, 2019
Applicant:

Chevron Phillips Chemical Company Lp, The Woodlands, TX (US);

Inventors:

Chung Ching Tso, Bartlesville, OK (US);

Errun Ding, Mason, OH (US);

Randall S. Muninger, Dewey, OK (US);

John T. Blagg, Nowata, OK (US);

Yongwoo Inn, Bartlesville, OK (US);

Max P. McDaniel, Bartlesville, OK (US);

Ashish M. Sukhadia, Bartlesville, OK (US);

Sarah Eppinger, Bartlesville, OK (US);

Assignee:

Chevron Phillips Chemical Company LP, The Woodlands, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/16 (2006.01); C08F 210/16 (2006.01); C08L 23/06 (2006.01); C08F 4/6592 (2006.01);
U.S. Cl.
CPC ...
C08L 23/06 (2013.01); C08F 4/6592 (2013.01); C08F 210/16 (2013.01); C08L 23/16 (2013.01); C08L 2201/10 (2013.01); C08L 2203/16 (2013.01); C08L 2207/066 (2013.01); C08L 2314/02 (2013.01);
Abstract

Ethylene polymers having a density from 0.908 to 0.925 g/cm, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.


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