The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Aug. 01, 2017
Showa Denko K.k., Tokyo, JP;
Naoki Sekioka, Tokyo, JP;
Yuya Ohguma, Tokyo, JP;
Masanao Kamijo, Tokyo, JP;
Yoichiro Takenoshita, Tokyo, JP;
SHOWA DENKO K.K., Tokyo, JP;
Abstract
Provided is a method for producing a chloroprene graft copolymer latex containing no organic solvent and exhibiting high adhesive strength even for soft polyvinyl chloride. A method for producing a chloroprene graft copolymer latex includes a chloroprene polymerization step of giving a chloroprene polymer latex and a graft copolymerization step of giving a chloroprene graft copolymer latex. The chloroprene polymerization step is a step of subjecting at least chloroprene (A-1) of chloroprene (A-1) and a monomer (A-2) copolymerizable with chloroprene (A-1) to emulsion radical polymerization. The graft copolymerization step is a step of adding, to the chloroprene polymer latex, a (meth)acrylate (B) and an organic peroxide (C) having an octanol/water partition coefficient of −2.0 or more and 3.0 or less to subject the chloroprene polymer to graft copolymerization with the (meth)acrylate (B) at a temperature of 10° C. or more and 40° C. or less.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile