The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Apr. 22, 2019
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Sezhian Annamalai, Madison, AL (US);

Carlos Alberto Duran, Ottawa, CA;

Kenneth Edward Hrdina, Horseheads, NY (US);

William Rogers Rosch, Corning, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/076 (2006.01); C03C 3/06 (2006.01); C03C 3/112 (2006.01); C03B 19/12 (2006.01); C03C 3/089 (2006.01); C03C 23/00 (2006.01); C03B 19/14 (2006.01); C03B 25/00 (2006.01); C03B 25/02 (2006.01);
U.S. Cl.
CPC ...
C03C 3/076 (2013.01); C03B 19/12 (2013.01); C03B 19/1453 (2013.01); C03B 25/00 (2013.01); C03B 25/02 (2013.01); C03C 3/06 (2013.01); C03C 3/089 (2013.01); C03C 3/112 (2013.01); C03C 23/007 (2013.01); C03B 2201/10 (2013.01); C03B 2201/12 (2013.01); C03B 2201/42 (2013.01); C03C 2201/10 (2013.01); C03C 2201/12 (2013.01); C03C 2201/14 (2013.01); C03C 2203/52 (2013.01);
Abstract

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.


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