The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Sep. 11, 2017
Applicant:
Morimura Sofc Technology Co., Ltd., Komaki, JP;
Inventors:
Satoru Ishida, Nagoya, JP;
Tomoki Murata, Nagoya, JP;
Ryoji Tanimura, Nagoya, JP;
Tatsuya Ono, Nagoya, JP;
Nobuyuki Hotta, Nagoya, JP;
Assignee:
MORIMURA SOFC TECHNOLOGY CO., LTD., Komaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/42 (2006.01); H01M 8/02 (2016.01); C25B 9/00 (2021.01); C25B 9/70 (2021.01); H01M 8/2457 (2016.01); H01M 8/2483 (2016.01); H01M 8/242 (2016.01); H01M 8/12 (2016.01);
U.S. Cl.
CPC ...
C01B 33/42 (2013.01); C25B 9/00 (2013.01); C25B 9/70 (2021.01); H01M 8/02 (2013.01); H01M 8/242 (2013.01); H01M 8/2457 (2016.02); H01M 8/2483 (2016.02); H01M 8/12 (2013.01);
Abstract
A mica-made member having a crystal structure exhibiting an intensity peak of KMg(SiAl)O(OH)and an intensity peak of MgSiOin X-ray diffractometry (XRD). Also disclosed is an electrochemical reaction unit including a structural member formed of the mica-made member and an electrochemical reaction cell stack.