The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Nov. 23, 2016
Applicant:

Wacker Chemie Ag, Munich, DE;

Inventors:

Martin Zettl, Burghausen, DE;

Andreas Hirschmann, Ering, DE;

Uwe Pätzold, Burghausen, DE;

Robert Ring, Haiming, DE;

Assignee:

WACKER CHEMIE AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01);
U.S. Cl.
CPC ...
C01B 33/1071 (2013.01);
Abstract

The invention relates to a process for hydrogenating silicon tetrachloride in a reactor, wherein a reactant gas containing hydrogen and silicon tetrachloride is heated to a temperature between 850° C. and 1600° C. by means of at least one heating element, which comprises a graphite surface, wherein the temperature of the heating element is between 850° C. and 1600° C. The process is characterized in that a nitrogen compound is added to the reactant gas in a substance amount fraction of 0.1 to 10% based on hydrogen.


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