The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Oct. 19, 2016
Applicant:

Precitec Optronik Gmbh, Neu-Isenburg, DE;

Inventors:

Martin Schönleber, Aschaffenburg, DE;

Christoph Dietz, Obertshausen, DE;

Assignee:

PRECITEC OPTRONIK GMBH, Neuisenburg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/03 (2006.01); G01B 9/02 (2006.01); G01B 11/22 (2006.01); B23K 26/04 (2014.01); B23K 26/08 (2014.01); B23K 26/21 (2014.01); B23K 26/06 (2014.01);
U.S. Cl.
CPC ...
B23K 26/032 (2013.01); B23K 26/03 (2013.01); B23K 26/048 (2013.01); B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/0665 (2013.01); B23K 26/0884 (2013.01); B23K 26/21 (2015.10); G01B 9/02019 (2013.01); G01B 9/02044 (2013.01); G01B 9/02083 (2013.01); G01B 9/02091 (2013.01); G01B 11/22 (2013.01); G01B 2290/65 (2013.01);
Abstract

A method for measuring the depth of the vapour cavity during an industrial machining process employs a high-energy beam. An optical measuring beam is directed towards the base of a vapour cavity. An optical coherence tomograph generates interference factors or other raw measurement data from reflections of the measurement beam. An evaluation device generates undisturbed measurement data, wherein raw measurement data that is generated at different times is processed together in the course of a mathematical operation. This operation can be a subtraction or a division. Slowly changing interference factors can thus be eliminated. An end value for the distance to the base of the vapour cavity is calculated from the undisturbed measurement data using a filter. As a result, the depth of the vapour cavity can be determined, in the knowledge of the distance at a part of the surface of the work piece that is not exposed to the high-energy beam.


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