The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Nov. 21, 2018
Hdl Therapeutics, Inc., Vero Beach, FL (US);
Hollis Bryan Brewer, Potomac, MD (US);
Michael M. Matin, Short Hills, NJ (US);
Timothy Jon Perlman, Pleasanton, CA (US);
HDL Therapuetics, Inc., Vero Beach, FL (US);
Abstract
Methods of priming a plasma processing system are disclosed. The plasma processing system has a number of different fluid flow circuits that are defined by sources of fluid, fluid flow paths, waste containers, a mixer, a separator, valves and a pump. A first fluid circuit is flushed, where the first fluid circuit is defined by a source of a first fluid, a first valve positioned between the source of the first fluid and the first fluid flow path, a second valve positioned between the first fluid flow path and the second fluid flow path, a first pump positioned between the second fluid flow path and the third fluid flow path, and a first waste container in fluid communication with the third fluid flow path. A second fluid circuit is then flushed by closing and opening certain valves.