The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2021

Filed:

Apr. 05, 2019
Applicant:

Fujitsu Limited, Kawasaki, JP;

Inventors:

Yuhei Umeda, Kawasaki, JP;

Tsutomu Ishida, Kawasaki, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06N 20/00 (2019.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/00 (2013.01); G06N 20/00 (2019.01); G06T 2207/30148 (2013.01);
Abstract

A non-transitory computer-readable recording medium storing a program that causes a computer to execute a procedure, the procedure includes generating, for each of a plurality of wafers, extended coordinates including a position on the wafer and a value calculated from a distance from a center of the wafer and a contribution parameter, for each defect on the wafer by using information of a defect position on the wafer, generating a Betti number group by persistent homology processing for a plurality of extended coordinates generated for each of the plurality of wafers generating, for each of the plurality of wafers, a defect pattern image from a plurality of Betti number groups generated for the plurality of values of contribution parameter, and generating machine learning data associating a plurality of defect pattern images generated for the plurality of wafers with determination information associated with the plurality of wafers.


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