The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2021

Filed:

Nov. 06, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Joel P. de Souza, Putnam Valley, NY (US);

Yun Seog Lee, White Plains, NY (US);

Ning Li, White Plains, NY (US);

Devendra K. Sadana, Pleasantville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/04 (2006.01); G06N 3/063 (2006.01); G06N 3/08 (2006.01); H01M 10/00 (2006.01);
U.S. Cl.
CPC ...
G06N 3/04 (2013.01); G06N 3/063 (2013.01); G06N 3/0635 (2013.01); G06N 3/084 (2013.01); H01M 10/00 (2013.01);
Abstract

Methods for controlling the resistance of a controllable resistive element include determining an amount of electrical resistance change for the controllable resistive element. A concentration difference is determined for a charge carrier ion in a resistor layer of the controllable resistance element that corresponds to the electrical resistance change for the controllable resistive element. A duration and amplitude of a current pulse is determined that changes the charge carrier ion concentration by the determined difference. A positive or negative current pulse is applied to a controllable resistive element for the determined duration.


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