The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2021

Filed:

May. 16, 2019
Applicant:

Omron Corporation, Kyoto, JP;

Inventors:

Hitoshi Nakatsuka, Kawanishi, JP;

Toyoo Iida, Nagaokakyo, JP;

Assignee:

OMRON Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/521 (2017.01); G01C 3/08 (2006.01);
U.S. Cl.
CPC ...
G06K 9/00201 (2013.01); G06T 7/521 (2017.01); G01C 3/08 (2013.01);
Abstract

A measurement system includes a first distance calculation unit that searches for a corresponding region, indicating a same array as an array of codes indicated by a predetermined number of reference patterns included in a unit region set in the projection pattern, from a set of the codes, and calculates a distance from an irradiation reference surface of the projection pattern to each portion of the object on the basis of a search result of the corresponding region, and a second distance calculation unit that attempts to estimate a distance for the defective portion for which the first distance calculation unit is not able to calculate the distance by reconstructing an incomplete code corresponding to the defective portion using peripheral information in the input image.


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