The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Jan. 26, 2017
Siemens Industry Software Inc., Plano, TX (US);
Tsz Ling Elaine Tang, Plainsboro, NJ (US);
Lucia Mirabella, Plainsboro, NJ (US);
Louis Komzsik, Huntington Beach, CA (US);
Livio Dalloro, Plainsboro, NJ (US);
David Madeley, Louth, GB;
Siemens Industry Software Inc., Plano, TX (US);
Abstract
A system and method are provided for adaptive domain reduction for thermo-structural simulation of an additive manufacturing process. The system may include a processor configured to carry out a simulation of a part being additively produced according to a set of tool paths. The simulation may include determining an original mesh of the part; determining an order of the elements of the original mesh to deposit; and simulating an incremental deposit of each of the elements of the original mesh for a material in the order that the elements are determined to be deposited. For each incremental deposit of an additional respective element the processor may determine thermal characteristics and structural deformation characteristics of the deposited elements. After the deposit of several layers have been simulated, subsequent simulation of elements may be carried out based on a respective modified version of the original mesh in which at least some of the layers of the original mesh previously simulated to be deposited under a current layer are retained and at least some are omitted.