The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Oct. 19, 2018
Ian D. Hosein, Minoa, NY (US);
Ian D. Hosein, Minoa, NY (US);
Syracuse University, Syracuse, NY (US);
Abstract
The formation of microporous surfaces through polymer induced phase separation in a photopolymer solvent mixture using photopolymerization via light self-focusing and self-trapping. The self-trapping of light sets fixed regions of brightness and darkness, sustained by the polymerization of light, and then wave guiding within the substrate. Phase separation occurs with the solvent phase separating in the regions of darkness and crosslinking in the regions of brightness. Upon removal of the solvent, precise and uniformly dispersed pores are created in the surface. The pore size and spacing may be tuned by adjusting the weight fraction of the photopolymer solvent mixture as well as through changes in the mask pattern.