The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Nov. 29, 2017
Arianegroup Gmbh, Taufkirchen, DE;
Joël Deck, Neudenau, DE;
Bernd Pfeiffer, Moeckmuehl, DE;
ArianeGroup GmbH, Taufkirchen, DE;
Abstract
A gas inlet (), in particular for use in an ion thruster, comprises a housing () which is made of a gas-tight ceramics material and which is provided with a first gas feed channel () and a second gas feed channel () arranged downstream of the first gas feed channel (). The gas inlet () further comprises an insert () which is arranged in the second gas feed channel () and is made of a porous ceramics material, wherein the geometry and pore structure of the insert () are such that the insert () forms a desired flow resistance for a gas stream flowing through the second gas feed channel () which is greater than a flow resistance acting on a gas stream flowing through the first gas feed channel (), and wherein a ratio of a length () of the first gas feed channel () to a length () of the insert () is at least 1:2.