The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Mar. 12, 2020
Yungu (Gu'an) Technology Co., Ltd., Langfang, CN;
Enxia Wang, Langfang, CN;
Lingtao Ou, Langfang, CN;
Weili Li, Langfang, CN;
Xiaopeng Lv, Langfang, CN;
Shuaiyan Gan, Langfang, CN;
Ya Wang, Langfang, CN;
YUNGU (GU'AN) TECHNOLOGY CO., LTD., Langfang, CN;
Abstract
The present disclosure relates to a method of a mask layout, including: providing a frame with preset areas arranged at intervals, a positioning area between two adjacent preset areas, and a fixed area provided to offset from the positioning area and each of the preset areas, and a distance between two adjacent preset areas being a first predetermined distance L; providing a cover mask corresponding to the positioning area, and a distance between an edge of the cover mask and the center of the positioning area being a second predetermined distance L; and providing an evaporation mask on the fixed area according to preset conditions, a distance between two adjacent fixed areas being a third predetermined distance L, and the third predetermined distance Lbeing equal to a difference between the first predetermined distance Land the second predetermined distance L