The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2021

Filed:

Feb. 18, 2019
Applicant:

Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);

Inventor:

Chimaobi W. Mbanaso, Chaska, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B08B 11/00 (2006.01); B08B 5/04 (2006.01); B08B 5/02 (2006.01);
U.S. Cl.
CPC ...
B08B 3/02 (2013.01); B08B 5/02 (2013.01); B08B 5/04 (2013.01); B08B 11/00 (2013.01);
Abstract

This invention relates to systems and methods that produce a treatment beam with a controllable beam size. This is accomplished by providing an auxiliary chamber in open fluid communication with the main process chamber. A nozzle is mounted in a recessed manner in the auxiliary chamber. The nozzle dispenses a treatment spray into the auxiliary chamber. The auxiliary chamber shapes and dispenses the treatment material as a treatment beam into the process chamber. In illustrative embodiments, control of process chamber pressure adjusts the beam size of a treatment beam used to treat the surface of one or more microelectronic substrates.


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