The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2021

Filed:

May. 16, 2019
Applicant:

The George Washington University, Washington, DC (US);

Inventors:

Zhenyu Li, McLean, VA (US);

Baichen Li, Fairfax, VA (US);

Assignee:

THE GEORGE WASHINGTON UNIVERSITY, Washington, DC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01); G05D 7/06 (2006.01); F04B 43/04 (2006.01); G05D 16/20 (2006.01); G01N 35/00 (2006.01); G01N 35/10 (2006.01); G01N 15/14 (2006.01);
U.S. Cl.
CPC ...
B01L 3/50273 (2013.01); B01L 3/502715 (2013.01); B01L 3/502738 (2013.01); F04B 43/043 (2013.01); G01N 35/00871 (2013.01); G05D 7/0694 (2013.01); G05D 16/2013 (2013.01); G05D 16/2024 (2019.01); G05D 16/2026 (2013.01); B01L 2200/10 (2013.01); B01L 2200/146 (2013.01); B01L 2200/16 (2013.01); B01L 2300/024 (2013.01); B01L 2300/123 (2013.01); B01L 2300/14 (2013.01); B01L 2400/0487 (2013.01); B01L 2400/0666 (2013.01); G01N 15/1484 (2013.01); G01N 2035/00237 (2013.01); G01N 2035/1034 (2013.01);
Abstract

A handheld system includes a reference pressure source configured to generate a reference pressure. The handheld system also includes a primary pressure source coupled to the reference pressure source. The primary pressure source is configured to generate a primary pressure in a primary pressure range. The primary pressure is less than the reference pressure, and the primary pressure is induced by the reference pressure source. The handheld system also includes a secondary pressure source coupled to the primary pressure source. The secondary pressure source is configured to generate a secondary pressure in a secondary pressure range. The secondary pressure is less than the primary pressure, and the secondary pressure is induced by the primary pressure source.


Find Patent Forward Citations

Loading…