The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Sep. 13, 2016
Applicant:
Ngk Insulators, Ltd., Nagoya, JP;
Inventors:
Assignee:
NGK Insulators, Ltd., Nagoya, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 63/06 (2006.01); B01D 69/12 (2006.01); B01D 53/22 (2006.01); B01D 67/00 (2006.01); B01D 46/24 (2006.01); B01D 71/02 (2006.01); B01D 61/36 (2006.01);
U.S. Cl.
CPC ...
B01D 63/066 (2013.01); B01D 46/247 (2013.01); B01D 46/2429 (2013.01); B01D 53/228 (2013.01); B01D 61/362 (2013.01); B01D 67/0046 (2013.01); B01D 69/12 (2013.01); B01D 63/061 (2013.01); B01D 71/021 (2013.01); B01D 71/024 (2013.01); B01D 2325/20 (2013.01);
Abstract
A monolithic separation membrane structure comprises a support body and a separation membrane. The support body is composed of a porous material and includes a plurality of through holes. The separation membrane is formed in a tubular shape on an inner side of the plurality of through holes, and is used in a penetrative vaporization method or a vapor infiltration method. The helium gas permeation resistance in the support body is less than 8.3×10Pa·sec/m.