The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2021

Filed:

Sep. 06, 2019
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Yukitomo Hirochi, Toyama, JP;

Kazuhiro Yuasa, Toyama, JP;

Tetsuo Yamamoto, Toyama, JP;

Yoshihiko Yanagisawa, Toyama, JP;

Shinya Sasaki, Toyama, JP;

Noriaki Michita, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/67 (2006.01); H01L 21/324 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/324 (2013.01); H01L 21/67196 (2013.01); H01L 21/67766 (2013.01);
Abstract

There is provided a technique that includes a process chamber including a gate valve that opens and closes a loading and unloading port configured to load and unload a substrate, and configured to heat and process the substrate by a heater using a microwave; a substrate transfer chamber including a purge gas distribution mechanism configured to distribute a purge gas supplied from a clean unit capable of introducing the purge gas; a transfer machine installed inside the substrate transfer chamber and configured to transfer the substrate into the process chamber; and a substrate cooling mounting tool configured to cool the substrate transferred from the process chamber by the transfer machine.


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