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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11018015 B1

PDFFull Text
Date of Patent:
May. 25, 2021

Filed:

Dec. 19, 2018

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Tsutomu Ogihara, Joetsu, JP;

Daisuke Kori, Joetsu, JP;

Seiichiro Tachibana, Joetsu, JP;

Yusuke Biyajima, Joetsu, JP;

Naoki Kobayashi, Joetsu, JP;

Kazumi Noda, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Lan Vinh

Int. Cl.
CPC ...
G03F 7/075 (2006.01); H01L 21/308 (2006.01); G03F 7/09 (2006.01); G03F 7/38 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); C08K 5/00 (2006.01); C08G 16/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/3081 (2013.01); H01L 21/3088 (2013.01); C08G 16/0225 (2013.01); C08K 5/0025 (2013.01);
Abstract

The invention provides: a composition for forming an organic film, the composition having high filterability and enabling formation of an organic film which has high pattern-curving resistance, and which prevents a high-aspect line pattern particularly finer than 40 nm from line collapse and twisting after dry etching; a method for forming an organic film and a patterning process which use the composition; and a substrate for manufacturing a semiconductor device, including the organic film formed on the substrate. The composition for forming an organic film includes a condensate (A), which is a condensation product of dihydroxynaphthalene shown by the following formula (1) and a condensation agent, or a derivative of the condensate (A). A sulfur content among constituent elements contained in the condensate (A) or the derivative of the condensate (A) is 100 ppm or less in terms of mass.

Find Patent Forward Citations

Ogihara, Tsutomu. (2021). Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process (U.S. Patent No. 11018015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11018015

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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